GAS DISTRIBUTION SYSTEM FOR OPTIMIZATION OF THE TECHNOLOGICAL PROCESS OF COATING IN AN UNBALANCED MAGNETRON SPUTTERING INSTALLATION
DOI:
https://doi.org/10.17770/etr2021vol3.6525Keywords:
optimization, distribution, gas, vacuum chamber, magnetron sputteringAbstract
The paper proposes a new design solution for regulating the distribution of the working gases in the vacuum chamber of the installation (UDP -850/4) for unbalanced magnetron sputtering, which will improve the mode and quality of application of multilayer nano-coatings. Constructive documentation for manufacturing a gas distribution system has been prepared, as well as instructions for assembly to the vacuum chamber.
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